Excitation of Surface Plasmon Polaritons on sinusoidally corrugated metal-dielectric interface fabricated using interference lithography

P. Ryba; S. Lis; W. Macherzynski; S. Patela

doi:10.1117/12.923063

25 April 2012 Excitation of Surface Plasmon Polaritons on sinusoidally corrugated metal-dielectric interface fabricated using interference lithography

P. Ryba, S. Lis, W. Macherzynski, S. Patela

Author Affiliations +

Proceedings Volume 8425, Photonic Crystal Materials and Devices X; 842526 (2012) https://doi.org/10.1117/12.923063
Event: SPIE Photonics Europe, 2012, Brussels, Belgium

Abstract

Using Finite-difference time-domain (FDTD) method, the excitation of surface plasmon polaritons (SPP) at the sinusoidally corrugated metal-dielectric interface was simulated. The sample structure was made by creating onedimension sinusoidally corrugated dielectric layer on top of metal thin film deposited on dielectric substrate. The thickness of metal film was simulated in range from 10 to 200 nm. Sinusoidally corrugated grating was modelled with different pitch and height. Additionally influence of a dielectric layer between grating and metal layer was simulated. The optical response of the structure was obtained in the regime of wavelength and angle. All simulations were performed for gold (Au) thin films deposited on glass substrate. Then selected structures were fabricated and measured. The gold film was thermally evaporated on glass substrate then the one-dimension sinusoidally corrugated dielectric layer was made in a photoresist using interference lithography.

Citation Download Citation

P. Ryba, S. Lis, W. Macherzynski, and S. Patela "Excitation of Surface Plasmon Polaritons on sinusoidally corrugated metal-dielectric interface fabricated using interference lithography", Proc. SPIE 8425, Photonic Crystal Materials and Devices X, 842526 (25 April 2012); https://doi.org/10.1117/12.923063

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