Low f-number microlens array fabricated in thick resist

Giuseppe A. Cirino; Arlindo N. Montagnoli; Patrick Verdonck; Luiz G. Neto

doi:10.1117/12.914417

8 May 2012 Low f-number microlens array fabricated in thick resist

Giuseppe A. Cirino, Arlindo N. Montagnoli, Patrick Verdonck, Luiz G. Neto

Proceedings Volume 8428, Micro-Optics 2012; 842819 (2012) https://doi.org/10.1117/12.914417
Event: SPIE Photonics Europe, 2012, Brussels, Belgium

Abstract

In certain applications of MOEMS devices, it is often necessary to produce microlens array structures that concentrate optical power in semiconductor photodetectors. In this work, the design and fabrication of a low f-number cylindrical microlens array is presented. The lenses were fabricated in thick photo resist - 12 μm thick - using a contact printer exposure through a mask with a repetitive 6 μm line - 4 μm space pattern. The width of the resulting microlens array was determined to be 10 μm, with f-number of 0.5. Numerical calculations based on scalar diffraction theory were employed to model the light propagation inside the resist, determining the aerial image as a function of its thickness. Than the resist response characteristics, expressed by its contrast curve, and absorption rate were used to obtain a cross section profile. A good match between numerical and experimental results were found.

Citation Download Citation

Giuseppe A. Cirino, Arlindo N. Montagnoli, Patrick Verdonck, and Luiz G. Neto "Low f-number microlens array fabricated in thick resist", Proc. SPIE 8428, Micro-Optics 2012, 842819 (8 May 2012); https://doi.org/10.1117/12.914417

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