Spectra of fields for applications of polymeric 3D micro/nanostructures is rapidly widening thus demanding
the development of versatile precise and efficient fabrication methods that can be used to process a variety
of materials and could be implemented to form tiny devices on a variety of surfaces without influencing their
structural quality. We present the latest results obtained using laser lithography approach: 3D polymeric
structures with submicrometer spatial resolution on different opaque surfaces such as semiconductors (Si) and
various metals (Cr, Al, Fe, Ti). The photostructuring was performed using a range of photosensitive materials
such as acrylate based AKRE23, acrylated biodegradable PEG-DA-258, epoxy based mr-NIL 6000, hybrid
organic-inorganic SZ2080 and Ormocore b59.© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.