Paper
10 May 2012 Direct laser writing of 3D micro/nanostructures on opaque surfaces
Sima Rekštytė, Albertas Žukauskas, Vytautas Purlys, Yuri Gordienko, Mangirdas Malinauskas
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Abstract
Spectra of fields for applications of polymeric 3D micro/nanostructures is rapidly widening thus demanding the development of versatile precise and efficient fabrication methods that can be used to process a variety of materials and could be implemented to form tiny devices on a variety of surfaces without influencing their structural quality. We present the latest results obtained using laser lithography approach: 3D polymeric structures with submicrometer spatial resolution on different opaque surfaces such as semiconductors (Si) and various metals (Cr, Al, Fe, Ti). The photostructuring was performed using a range of photosensitive materials such as acrylate based AKRE23, acrylated biodegradable PEG-DA-258, epoxy based mr-NIL 6000, hybrid organic-inorganic SZ2080 and Ormocore b59.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sima Rekštytė, Albertas Žukauskas, Vytautas Purlys, Yuri Gordienko, and Mangirdas Malinauskas "Direct laser writing of 3D micro/nanostructures on opaque surfaces", Proc. SPIE 8431, Silicon Photonics and Photonic Integrated Circuits III, 843123 (10 May 2012); https://doi.org/10.1117/12.921387
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Cited by 4 scholarly publications.
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KEYWORDS
Chromium

Opacity

Polymers

Aluminum

Iron

Multiphoton lithography

Nanoimprint lithography

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