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Proceedings Article

Use of tin as a plasma source material for high conversion efficiency

[+] Author Affiliations
Toshihisa Tomie, Gohta Niimi, Hidehiko Yashiro, Jingqian Lin, Isao Matsushima, Dong-Hoon Lee, Kentaro Nishigori

National Institute of Advanced Industrial Science and Technology (Japan)

Tatsuya Aota

Japan Society for the Promotion of Science (Japan)

Yoshifumi Ueno

Association of Super-Advanced Electronic Technologies (Japan)

Kazumasa Komiyama

Tokyo Science Univ. (Japan)

Hiroshi Yokota

Shinshu Univ. (Japan)

Proc. SPIE 5037, Emerging Lithographic Technologies VII, 147 (June 13, 2003); doi:10.1117/12.483751
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From Conference Volume 5037

  • Emerging Lithographic Technologies VII
  • Roxann L. Engelstad
  • Santa Clara, CA | February 23, 2003

abstract

Debris-free generation of a tin plasma was demonstrated in the cavity-confined configuration. Narrow band emission at 13.7-nm was observed in an emission spectrum of a cavity confined tin plasma. The spectral efficiency was as high as 12% and we found the conversion efficiency could reach 6%/2π str ultimately while lots of works are required to achieve this value. We also confirmed a magnetic field has some effect of stopping a plasma.

© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Toshihisa Tomie ; Tatsuya Aota ; Yoshifumi Ueno ; Gohta Niimi ; Hidehiko Yashiro, et al.
"Use of tin as a plasma source material for high conversion efficiency", Proc. SPIE 5037, Emerging Lithographic Technologies VII, 147 (June 13, 2003); doi:10.1117/12.483751; http://dx.doi.org/10.1117/12.483751


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