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Proceedings Article

Portable phase measuring interferometer using Shack-Hartmann method

[+] Author Affiliations
Toru Fujii, Jun Kougo, Yasushi Mizuno, Hiroshi Ooki, Masato Hamatani

Nikon Corp. (Japan)

Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, 726 (May 27, 2003); doi:10.1117/12.482699
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From Conference Volume 5038

  • Metrology, Inspection, and Process Control for Microlithography XVII
  • Daniel J. Herr
  • Santa Clara, CA | February 23, 2003

abstract

A real-time inspection is useful and effective to optimize lens aberrations of excimer-exposure sytem, which can expose patterns less than 100 nm. We have developed a portable i.e., compact and lightweight phase measuring interferometer (P-PMI), which can be attached to a stage of the exposure system during real-time monitoring the aberration of the projection lens mounted on the exposure system. Measured repeatability of the wavefront measurement is ab out 0.1 mλ and tool-to-tool difference is 0.6mλ. Measured wavefront during adjusting a projection lens agree dwell with a simulated result. LWA was successfully optimized using P-PMI data.

© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Toru Fujii ; Jun Kougo ; Yasushi Mizuno ; Hiroshi Ooki and Masato Hamatani
"Portable phase measuring interferometer using Shack-Hartmann method", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, 726 (May 27, 2003); doi:10.1117/12.482699; http://dx.doi.org/10.1117/12.482699


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