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Proceedings Article

Silicon immersion gratings for very high-resolution infrared spectroscopy

[+] Author Affiliations
Daniel L. McDavitt

The Pennsylvania State Univ. (USA) and Univ. of Florida (USA)

Jian Ge, Shane Miller, Junfeng Wang

The Pennsylvania State Univ. (USA) and Univ. of Florida (USA)

Proc. SPIE 5494, Optical Fabrication, Metrology, and Material Advancements for Telescopes, 536 (September 24, 2004); doi:10.1117/12.552028
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From Conference Volume 5494

  • Optical Fabrication, Metrology, and Material Advancements for Telescopes
  • Eli Atad-Ettedgui; Philippe Dierickx
  • Kona, United States | June 21, 2004

abstract

In our group, development of large format silicon immersion gratings with sizes up to 4 inches in diameter is a routine practice. The first silicon anamorphic immersion grating has an 80x50 mm2 etched grating area, a 63.5° blazed angle and a 5.4 l/mm groove density (or 185 μm period) on a 30mm thick silicon substrate. The groove density is about 4 times coarser than any existing commercial echelle grating, allowing a complete coverage of a cross-dispersed echelle spectrum on a 1k x 1k IR array at R = 220,000 in the K band. The optical measurements show the grating has a high quality wavefront and surface. The rms wavefront error is 0.125 waves and the integrated scattered light is ~1% at 0.6328 nm. A silicon immersion grating with an 85x50 mm2 etched area, a 54.7° blazed angle and 16.1 l/mm groove density on a 40 mm thickness allows for complete wavelength coverage of 1.2-2.4 μm on a 2kx2k IR array. We are in the middle of processing a silicon disk with a 6 inch diameter and 2.5 inch thickness to make a large format silicon immersion grating for the Gemini next generation Advanced Cryogenic Echelle Spectrograph (ACES) and space applications.

© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Daniel L. McDavitt ; Jian Ge ; Shane Miller and Junfeng Wang
"Silicon immersion gratings for very high-resolution infrared spectroscopy", Proc. SPIE 5494, Optical Fabrication, Metrology, and Material Advancements for Telescopes, 536 (September 24, 2004); doi:10.1117/12.552028; http://dx.doi.org/10.1117/12.552028


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