Effect of technique parameters on characteristics of hydrogen-free DLC films deposited by surface wave-sustained plasma

Junqi Xu; Hiroyuki Kousaka; Noritsugu Umehara; Dongfeng Diao

doi:10.1117/12.667695

23 January 2006 Effect of technique parameters on characteristics of hydrogen-free DLC films deposited by surface wave-sustained plasma

Junqi Xu, Hiroyuki Kousaka, Noritsugu Umehara, Dongfeng Diao

Author Affiliations +

Proceedings Volume 6029, ICO20: Materials and Nanostructures; 60290P (2006) https://doi.org/10.1117/12.667695
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China

Abstract

Hydrogen-free diamond-like carbon (DLC) films were deposited by a new-type surface wave-sustained plasma physical vapor deposition (SWP-PVD) system under various technique conditions. Electron density was measured by a Langmuir probe, while the film thickness and hardness were characterized using a surface profilometer and a nanoindenter, respectively. Surface morphology was investigated by an atomic force microscope (AFM). It was found that the electron density and deposition rate increased following the increase in microwave power, target voltage, or gas pressure. The typical electron density and deposition rate were about 1.87-2.04×10¹¹ cm^-3 and 1.61-14.32 nm/min respectively. AFM images indicated that the grains of films changes as the technique parameters vary. The optical constants, refractive index n and extinction coefficient k, were obtained using an optical ellipsometry. With the increase in microwave power from 150 to 270 W, the extinction coefficient of DLC films increased from 0.05 to 0.27 while the refractive index decreased from 2.31 to 2.18.

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Junqi Xu, Hiroyuki Kousaka, Noritsugu Umehara, and Dongfeng Diao "Effect of technique parameters on characteristics of hydrogen-free DLC films deposited by surface wave-sustained plasma", Proc. SPIE 6029, ICO20: Materials and Nanostructures, 60290P (23 January 2006); https://doi.org/10.1117/12.667695

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