Modern photolithography is based on the use of excimer lasers with the radiation wavelength of 193 nm and 157 nm.
Further steps aimed at achieving a higher resolution of displayed structures lead to a reduction of the radiation
wavelength and a considerable rise of the cost of lithographic system. In this connection, the search of alternative image
generation methods being suitable for the use in extreme short-wave photolithography is becoming especially urgent.
In order to develop an alternative method based on optical holographic principles, two versions of schemes for recording
and reconstruction of relief-phase reflection holograms providing speckle-free images of two-dimensional microscopic
objects have been scientifically justified and experimentally verified. The first of them is based on the replacement of
projection objective with relief-phase reflection hologram-projector registered on chalcogenide glassy layer. The second
one is closed to the near-field correction being conventional for photolithography.
As a result of this work, samples of holograms-projectors forming an image of the photolithographic test-object with the
characteristic size of 0.8 μm at the wavelength of 0.488 μm were obtained. On the whole, the results show an availability of further works aimed at the implementation of optical holographic methods into short-wave photolithography.© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.