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Proceedings Article

Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters

[+] Author Affiliations
Juan Manuel Russo, Jose E. Castillo, Raymond K. Kostuk

The Univ. of Arizona

Proc. SPIE 6653, Linear and Nonlinear Optics of Organic Materials VII, 66530D (September 13, 2007); doi:10.1117/12.732572
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From Conference Volume 6653

  • Linear and Nonlinear Optics of Organic Materials VII
  • Jean-Michel Nunzi
  • San Diego, CA | August 26, 2007

abstract

The good optical properties of PQ (phenanthrenequinone)-doped PMMA (poly methylmethacrylate) and its flexibility to fabricate different substrate configurations make this material attractive for holographic recording. In previous work, filters in PQ/PMMA for Wavelength Division Multiplexing (WDM) and Optical Code Division Multiple Access (OCDMA) were demonstrated and shown to have a 0.03nm/°C thermal tuning range operating near 1550nm. In this paper we investigate the effect of adding silicon dioxide nanoparticles to PQ/PMMA in order to measure the thermal tuning range and investigate the performance of these filters.

© (2007) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Juan Manuel Russo ; Jose E. Castillo and Raymond K. Kostuk
"Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters", Proc. SPIE 6653, Linear and Nonlinear Optics of Organic Materials VII, 66530D (September 13, 2007); doi:10.1117/12.732572; http://dx.doi.org/10.1117/12.732572


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