Paper
15 July 2004 F2-laser microfabrication of efficient diffractive optical phase elements
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Abstract
The 157nm F2-laser drives strong and precisely controllable interactions with fused silica, the most widely used material for bulk optics, optical fibers, and planar optical circuits. Precise excisions of 10 to 40 nm depth are available that meet the requirements for generating efficient visible and ultraviolet diffractive optical elements (DOE). F2-laser radiation was applied in combination with beam homogenization optics and high-precision computer controlled motion stages to shape 16-level DOE devices on bulk glasses and optical fiber facets. A 128×128 pixel DOE was fabricated and characterized. Each level had distinguishable spacing of ~140 nm and surface roughness of ~38 nm. The far-field pattern when illuminated with a HeNe laser agreed well with the simulation results by an Iterative Fourier Transform Algorithm (ITFA). Improvements to increase the 1st order diffraction efficiency of 22% are offered.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mi Li Ng, Peter R. Herman, Amir H. Nejadmalayeri, and Jianzhao Li "F2-laser microfabrication of efficient diffractive optical phase elements", Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); https://doi.org/10.1117/12.537981
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Cited by 5 scholarly publications.
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KEYWORDS
Diffractive optical elements

Etching

Silica

Laser ablation

Light scattering

Surface roughness

Diffraction

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