Three-dimensional photolithography based on image reversal

Peng Yao; Garrett Schneider; Binglin Miao; Janusz Murakowski; Dennis Prather

doi:10.1117/12.524654

30 December 2003 Three-dimensional photolithography based on image reversal

Peng Yao, Garrett Schneider, Binglin Miao, Janusz Murakowski, Dennis Prather

Proceedings Volume 5342, Micromachining and Microfabrication Process Technology IX; (2003) https://doi.org/10.1117/12.524654
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

In this paper we present a novel fabrication method for the realization of complex 3D multi-layer structures with commercially available photoresists. This method is based on the observation that during an image-reversal process, the post exposure bake (PEB) that is used to reverse the contrast of the exposed pattern reduces the sensitivity of the unexposed photoresist at the same time. In multi-layer lithography, this phenomenon, along with non-uniformly distributed dose can be exploited to eliminate the re-patterning effect of the subsequent exposures and thus makes suspended 3D structures possible. In this presentation we demonstrate this observation experimentally, and fabricate “woodpile” structures (≥ 3 layers) using the proposed method.

Citation Download Citation

Peng Yao, Garrett Schneider, Binglin Miao, Janusz Murakowski, and Dennis Prather "Three-dimensional photolithography based on image reversal", Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); https://doi.org/10.1117/12.524654

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