Paper
23 February 2005 Frequency dependency of the characteristics in spiral-type thin film inductors
Author Affiliations +
Proceedings Volume 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II; (2005) https://doi.org/10.1117/12.582204
Event: Smart Materials, Nano-, and Micro-Smart Systems, 2004, Sydney, Australia
Abstract
In this study, spiral inductors on the SiO2/Si(100) substrate were fabricated by the magnetron sputtering method. Cu thin film with the thickness of 0.7~2.0 μm was deposited on the substrate. Square inductors were fabricated through the wet chemical etching technique. The inductors are completely specified by the number of turns, coil width and the coil spacing. Both the width and spacing were varied from 10 to 50 μm and from 20 to 70 μm, respectively. The Frequency dependency of inductance and Q factor were investigated to analyze the performance of spiral inductors.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bok-Ki Min, In-Sung Kim, and Jae-Sung Song "Frequency dependency of the characteristics in spiral-type thin film inductors", Proc. SPIE 5650, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems II, (23 February 2005); https://doi.org/10.1117/12.582204
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KEYWORDS
Inductance

Thin films

Copper

Sputter deposition

Magnetism

Wet etching

Metals

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