Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

nDSE-based overlay alignment: enabling technology for nano metrology and fabrication

[+] Author Affiliations
Jun Gao, Carl Picciotto, Wei Wu, Inkyu Park, William M. Tong

HP Labs.

Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615223 (March 24, 2006); doi:10.1117/12.656610
Text Size: A A A
From Conference Volume 6152

  • Metrology, Inspection, and Process Control for Microlithography XX
  • Chas N. Archie
  • San Jose, CA | February 19, 2006

abstract

Displacement sensing and estimation (DSE) is important preprocessing task for many image-based processing systems that extract information from multiple images. In last two years, we gained significant insight of the nature of DSE and developed theory and algorithm framework named nanoscale displacement sensing and estimation (nDSE). We also build procedures to apply nDSE to overlay alignment down to the nanoscale. We will introduce two basic theories: Phase Delay Detection (PDD) and Derivatives-based Maximum Likelihood Estimation (DML) and associated DSE algorithms, noticeably Near-Neighbor-Navigation (N-Cubed) algorithm. We presented our best nDSE experimental result of 1 nm (1σ) while tracking 5 nm stepping. To develop nDSE-based nanoscale alignment, we introduced our definition of displacement, alignment and pseudo-displacement. We presented both theoretical and practical procedures to use nDSE to achieve nano-alignment down to the 10s of nano-meters and beyond. Then we compared nDSE-based nano-alignment to other industry standard alignment method and attempt to show the substantial advantages of nDSE based alignment in terms of cost and simplicity of the system design.

© (2006) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Jun Gao ; Carl Picciotto ; Wei Wu ; Inkyu Park and William M. Tong
"nDSE-based overlay alignment: enabling technology for nano metrology and fabrication", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615223 (March 24, 2006); doi:10.1117/12.656610; http://dx.doi.org/10.1117/12.656610


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.