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Proceedings Article

Performance of actinic EUVL mask imaging using a zoneplate microscope

[+] Author Affiliations
Kenneth A. Goldberg, Patrick P. Naulleau, Senajith B. Rekawa, Charles D. Kemp, Robert F. Gunion, Farhad Salmassi, Eric M. Gullikson, Erik H. Anderson

Lawrence Berkeley National Lab.

Anton Barty

Lawrence Livermore National Lab.

Hak-Seung Han

SEMATECH

Proc. SPIE 6730, Photomask Technology 2007, 67305E (October 30, 2007); doi:10.1117/12.746756
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From Conference Volume 6730

  • Photomask Technology 2007
  • Robert J. Naber; Hiroichi Kawahira
  • Monterey, CA | September 17, 2007

abstract

The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a dual-mode, scanning and imaging extreme-ultraviolet (EUV) microscope designed for pre-commercial EUV mask research. Dramatic improvements in image quality have been made by the replacement of several critical optical elements, and the introduction of scanning illumination to im-prove uniformity and contrast. We report high quality actinic EUV mask imaging with resolutions as low as 100-nm half-pitch, (20-nm, 5× wafer equivalent size), and an assessment of the imaging performance based on several metrics. Modulation transfer function (MTF) measurements show high contrast imaging for features sizes close to the diffraction-limit. An investigation of the illumination coherence shows that AIT imaging is much more coherent than previously anticipated, with σ below 0.2. Flare measurements with several line-widths show a flare contribution on the order of 2-3% relative intensity in dark regions above the 1.3% absorber reflectivity on the test mask used for these experiments. Astigmatism coupled with focal plane tilt are the dominant aberrations we have observed. The AIT routinely records 250-350 high-quality images in numerous through-focus series per 8-hour shift. Typical exposure times range from 0.5 seconds during alignment, to approximately 20 seconds for high-resolution images.

© (2007) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Kenneth A. Goldberg ; Patrick P. Naulleau ; Anton Barty ; Senajith B. Rekawa ; Charles D. Kemp, et al.
"Performance of actinic EUVL mask imaging using a zoneplate microscope", Proc. SPIE 6730, Photomask Technology 2007, 67305E (October 30, 2007); doi:10.1117/12.746756; http://dx.doi.org/10.1117/12.746756


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