InP nanowire photodetectors heteroepitaxially grown between silicon electrodes

Ataur Sarkar; Anurag Chaudhry; V. J. Logeeswaran; Sungsoo Yi; M. Saif Islam

doi:10.1117/12.752513

10 September 2007 InP nanowire photodetectors heteroepitaxially grown between silicon electrodes

Ataur Sarkar, Anurag Chaudhry, V. J. Logeeswaran, Sungsoo Yi, M. Saif Islam

Proceedings Volume 6779, Nanophotonics for Communication: Materials, Devices, and Systems IV; 67790K (2007) https://doi.org/10.1117/12.752513
Event: Optics East, 2007, Boston, MA, United States

Abstract

We demonstrate an InP nanowire based photodetector laterally integrated between two (111)-oriented vertical silicon surfaces. The nanowires are grown through a simple single step chemical vapor deposition (CVD) process using gold nanoparticles as catalyst with in-situ p-doping and have been heteroepitaxially bridged between a pair of prefabricated p-doped Si electrodes. Nonlinear current-voltage characteristics are observed. Although this nonlinearity resembles a back-to-back rectifying profile it originates from space-charge limited conductivity of the nanowires. DC photoelectric characteristics of the device were measured under optical illumination (λ=630 nm) above the bandgap energy (1.34 eV or ~925 nm at room temperature) of InP. The variation in photoconductance with varying input optical power demonstrates high sensitivity of the device to optical illumination.

Citation Download Citation

Ataur Sarkar, Anurag Chaudhry, V. J. Logeeswaran, Sungsoo Yi, and M. Saif Islam "InP nanowire photodetectors heteroepitaxially grown between silicon electrodes", Proc. SPIE 6779, Nanophotonics for Communication: Materials, Devices, and Systems IV, 67790K (10 September 2007); https://doi.org/10.1117/12.752513

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