Paper
20 April 2005 The structure and physical properties of ultra-thin multi-element Si pin photodiode arrays for medical imaging applications
Bernd Tabbert, Chris Hicks, Ed Bartley, Hong Wu, Ilja Goushcha, Richard Metzler, Alexander O. Goushcha
Author Affiliations +
Abstract
Key features of a novel pin photodiode array structure built on 30-μm, 75-μm, and 100-μm thick single Silicon dies are discussed for the first time. Results of comparative studies of opto-electrical properties for a wide range of element sizes from ~ 200 μm square to ~ 1 mm square with the gaps between the adjacent elements as small as <20 μm are presented. The internal quantum efficiency was close to 100%, crosstalk was smaller than 0.01% within the spectral range 400 to 800 nm. The crosstalk remained lower than 0.1% even in the case when the illuminated element was electrically isolated (open contact). Furthermore very low leakage current and high shunt resistance (above 1 GΩ) are characteristic for these devices. The results are imperative for creating of high quality imaging systems.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bernd Tabbert, Chris Hicks, Ed Bartley, Hong Wu, Ilja Goushcha, Richard Metzler, and Alexander O. Goushcha "The structure and physical properties of ultra-thin multi-element Si pin photodiode arrays for medical imaging applications", Proc. SPIE 5745, Medical Imaging 2005: Physics of Medical Imaging, (20 April 2005); https://doi.org/10.1117/12.595414
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CITATIONS
Cited by 5 scholarly publications and 2 patents.
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KEYWORDS
PIN photodiodes

Silicon

Photodiodes

Quantum efficiency

Semiconducting wafers

Modulation transfer functions

Imaging systems

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