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Proceedings Article

Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)

[+] Author Affiliations
Elmar Platzgummer, Hans Loeschner, Gerhard Gross

IMS Nanofabrication AG (Austria)

Proc. SPIE 7122, Photomask Technology 2008, 71220L (October 17, 2008); doi:10.1117/12.801441
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From Conference Volume 7122

  • Photomask Technology 2008
  • Hiroichi Kawahira; Larry S. Zurbrick
  • Monterey, CA | October 06, 2008

abstract

Projection Mask-Less Patterning (PMLP) is based on many hundred thousands of ion beams working in parallel. A PMLP proof-of-concept tool has been realized as part of the European project CHARPAN (Charged Particle Nanotech) and has been presented at SPIE Photomask BACUS 2007. Using 10 keV protons, 16nm hp resolution has been demonstrated in non- CAR materials (HSQ) with 25μC/cm2 exposure dose. The system is upgraded to a CHARPAN Engineering Tool (CHET) with a laser-interferometer controlled vacuum stage and a CMOS based programmable Aperture Plate System (APS) providing ca. 40,000 beams with < 20nm spot size. The engineering of an ion Mask Exposure Tool (iMET) for the 22nm hp mask node has been started; main iMET features are discussed.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Elmar Platzgummer ; Hans Loeschner and Gerhard Gross
"Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)", Proc. SPIE 7122, Photomask Technology 2008, 71220L (October 17, 2008); doi:10.1117/12.801441; http://dx.doi.org/10.1117/12.801441


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