Formation of a photo-oxidized protective thin film with waterproof and high-power laser tolerance properties

Masataka Murahara; Yuji Sato; Takayuki Funatsu; Takahisa Jitsuno; Yoshiaki Okamoto

doi:10.1117/12.804435

30 December 2008 Formation of a photo-oxidized protective thin film with waterproof and high-power laser tolerance properties

Masataka Murahara, Yuji Sato, Takayuki Funatsu, Takahisa Jitsuno, Yoshiaki Okamoto

Author Affiliations +

Proceedings Volume 7132, Laser-Induced Damage in Optical Materials: 2008; 71320K (2008) https://doi.org/10.1117/12.804435
Event: Boulder Damage Symposium XL Annual Symposium on Optical Materials for High Power Lasers, 2008, Boulder, Colorado, United States

Abstract

The organic silicone oil applied over the surface of a fused silica glass or Kaliumdihydrogenphosphat (KDP) nonlinear optical crystal was changed to an inorganic glass by the photochemical oxidization using a Xe₂ excimer lamp in the air. As a result, the thin film acquired a characteristic of high power laser tolerance equivalent to quartz. Dimethylsiloxane silicone oil was spin-coated on the surfaces of a fused silica substrate and KDP to form a film of 100-nm thickness; which were irradiated with the Xe₂ excimer lamp light (wavelength 172 nm, power density 10 mW/cm²) for 60 minutes in oxygen atmosphere. The films were further irradiated with the Nd: YAG laser of ω (1.06 μm) or 2ω (0.503 μm), and the laser damage test (J/cm²/10 ns) was conducted. The laser damage threshold of the photo-oxidized 100 nm thick film formed on the fused silica substrate was 72 J/cm²in ω and 107 J/cm² in 2ω. On the KDP substrate, the laser damage threshold of the thin film was 32.4J/cm² in ω and 32.6 J/cm² in 2ω.

Citation Download Citation

Masataka Murahara, Yuji Sato, Takayuki Funatsu, Takahisa Jitsuno, and Yoshiaki Okamoto "Formation of a photo-oxidized protective thin film with waterproof and high-power laser tolerance properties", Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71320K (30 December 2008); https://doi.org/10.1117/12.804435

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