Forward solve algorithms for optical critical dimension metrology

P. L. Jiang; H. Chu; J. Hench; Dan Wack

doi:10.1117/12.773003

24 March 2008 Forward solve algorithms for optical critical dimension metrology

P. L. Jiang, H. Chu, J. Hench, Dan Wack

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 69221O (2008) https://doi.org/10.1117/12.773003
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A review of selected current and new Maxwell equation solve algorithms used in critical dimension metrology is presented. We show that the standard RCWA can have serious issues under certain conditions, even in some typical scatterometry applications. We present some results showing that some of the newer algorithms we developed can significantly outperform the RCWA. The strengths and weakness of algorithms are illustrated.

Citation Download Citation

P. L. Jiang, H. Chu, J. Hench, and Dan Wack "Forward solve algorithms for optical critical dimension metrology", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221O (24 March 2008); https://doi.org/10.1117/12.773003

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