Comparison of spectroscopic Mueller polarimetry, standard scatterometry, and real space imaging techniques (SEM and 3D-AFM) for dimensional characterization of periodic structures

A. De Martino; M. Foldyna; T. Novikova; D. Cattelan; P. Barritault; C. Licitra; J. Hazart; J. Foucher; F. Bogeat

doi:10.1117/12.772721

16 April 2008 Comparison of spectroscopic Mueller polarimetry, standard scatterometry, and real space imaging techniques (SEM and 3D-AFM) for dimensional characterization of periodic structures

A. De Martino, M. Foldyna, T. Novikova, D. Cattelan, P. Barritault, C. Licitra, J. Hazart, J. Foucher, F. Bogeat

Author Affiliations +

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 69221P (2008) https://doi.org/10.1117/12.772721
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Spectroscopic Mueller polarimetry may provide a useful alternative to standard spectroscopic ellipsometry (SE) for the dimensional characterization of periodic structures, as it provides 16 quantities instead of 2 for SE. We present a detailed experimental comparison of the results provided by conventional scatterometry (0.7 - 5 eV) spectral range), Mueller polarimetry in the visible (450 - 825 nm), electron microscopy (top CD-SEM and cross section) and state-of-the-art CDAFM (Veeco X3D). This last instrument was considered as the best reference currently available. The samples were 1D gratings etched in bulk Si, with 150 and 250 nm nominal CDs and several pitches for each CD. SE spectra were taken at zero azimuthal angles (i.e. with the grooves perpendicular to the incidence plane), as it is usually done with standard scatterometers, while Mueller spectra were measured at all azimuths in steps of 5°, allowing significant consistency tests by comparing the results of the corresponding fits. Both techniques provided CD values in agreement with AFM and CD-SEM data to within 5 nm, comparable to the AFM precision. Grating thickness and sidewall angle (SWA) were best determined by Mueller polarimetry at 90° azimuth, while in the usual zero azimuth configuration, SWA was typically underestimated by several degrees.

Citation Download Citation

A. De Martino, M. Foldyna, T. Novikova, D. Cattelan, P. Barritault, C. Licitra, J. Hazart, J. Foucher, and F. Bogeat "Comparison of spectroscopic Mueller polarimetry, standard scatterometry, and real space imaging techniques (SEM and 3D-AFM) for dimensional characterization of periodic structures", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221P (16 April 2008); https://doi.org/10.1117/12.772721

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available