Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production

[+] Author Affiliations
Keiji Yoshimura, Hitoshi Nakano, Hideo Hata, Nobuyoshi Deguchi, Masamichi Kobayashi, Takeaki Ebihara, Yoshio Kawanobe, Tsuneo Kanda

Canon, Inc. (Japan)

Proc. SPIE 6924, Optical Microlithography XXI, 69241O (March 07, 2008); doi:10.1117/12.771876
Text Size: A A A
From Conference Volume 6924

  • Optical Microlithography XXI
  • San Jose, California, USA | February 24, 2008

abstract

Canon has developed an immersion exposure tool, the FPA-7000AS7 (AS7), with the industry's highest NA of 1.35. This paper reports on its performance. The AS7's projection lens achieves ultra-low aberration with total RMS of less than 5 mλ and flare of less than 0.5%. The resolution capability is 37 nm with k1 = 0.259, and DOF of 0.8 μm was obtained owing to the ultra-low aberration and low flare. Regarding focus performance, a 3σ value of 19.3 nm for Lstage and 16.1nm for R-stage were attained in a whole area. The result of CD uniformity of 1.91nm (3σ) was obtained across the wafer with a total of 4032 measurement points. Distortion was 3.9 nm at the worst value. On the other hand the most critical issue of immersion is defects, so the nozzle, lens and stage must be cleaned to reduce defects. The result of defect evaluation of the AS7 was an average of 0.042 defect/cm2 from 25 wafers in a lot and average 0.046 defect count/cm2 from long-term defect evaluation for two months. From these results, we are confident that the AS7 is capable of 45-nm node device production.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Keiji Yoshimura ; Hitoshi Nakano ; Hideo Hata ; Nobuyoshi Deguchi ; Masamichi Kobayashi, et al.
"Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production", Proc. SPIE 6924, Optical Microlithography XXI, 69241O (March 07, 2008); doi:10.1117/12.771876; http://dx.doi.org/10.1117/12.771876


Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).

Figures

Tables

NOTE:
Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Proceeding
Sign in or Create a personal account to Buy this proceeding ($15 for members, $18 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.