A methodology for double patterning compliant split and design

Vincent Wiaux; Staf Verhaegen; Fumio Iwamoto; Mireille Maenhoudt; Takashi Matsuda; Sergei Postnikov; Geert Vandenberghe

doi:10.1117/12.804697

4 December 2008 A methodology for double patterning compliant split and design

Vincent Wiaux, Staf Verhaegen, Fumio Iwamoto, Mireille Maenhoudt, Takashi Matsuda, Sergei Postnikov, Geert Vandenberghe

Proceedings Volume 7140, Lithography Asia 2008; 71401X (2008) https://doi.org/10.1117/12.804697
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

Double Patterning allows to further extend the use of water immersion lithography at its maximum numerical aperture NA=1.35. Splitting of design layers to recombine through Double Patterning (DP) enables an effective resolution enhancement. Single polygons may need to be split up (cut) depending on the pattern density and its 2D content. The split polygons recombine at the so-called 'stitching points'. These stitching points may affect the yield due to the sensitivity to process variations. We describe a methodology to ensure a robust double patterning by identifying proper split- and design- guidelines. Using simulations and experimental data, we discuss in particular metal1 first interconnect layers of random LOGIC and DRAM applications at 45nm half-pitch (hp) and 32nm hp where DP may become the only timely patterning solution.

Citation Download Citation

Vincent Wiaux, Staf Verhaegen, Fumio Iwamoto, Mireille Maenhoudt, Takashi Matsuda, Sergei Postnikov, and Geert Vandenberghe "A methodology for double patterning compliant split and design", Proc. SPIE 7140, Lithography Asia 2008, 71401X (4 December 2008); https://doi.org/10.1117/12.804697

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available