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Proceedings Article

Model-based sub-resolution assist features using an inverse lithography method

[+] Author Affiliations
Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

National Chiao Tung Univ. (Taiwan)

Proc. SPIE 7140, Lithography Asia 2008, 714014 (December 04, 2008); doi:10.1117/12.804678
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From Conference Volume 7140

  • Lithography Asia 2008
  • Alek C. Chen; Burn Lin; Anthony Yen
  • Taipei, Taiwan | November 04, 2008

abstract

The conventional segment-based OPC approach has been applied successfully for many CMOS generations and is currently favored. However, Inverse lithography technology (ILT) is a promising candidate for next-generation optical proximity correction (OPC). Still, there are issues that need to be thoroughly addressed and further optimized. In this work, we propose a model-based pre-OPC flow where the sizing of drawn patterns and placement of surrounding sub-resolution assist features (SRAF) are simultaneously generated in a single iteration using an ILT method. The complex patterns can then be simplified for a conventional OPC solution.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Jue-Chin Yu ; Peichen Yu and Hsueh-Yung Chao
"Model-based sub-resolution assist features using an inverse lithography method", Proc. SPIE 7140, Lithography Asia 2008, 714014 (December 04, 2008); doi:10.1117/12.804678; http://dx.doi.org/10.1117/12.804678


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