Spectral and spatial measurements of a laser-produced plasma EUV source for 13.5 nm based on a double stream Xe/He gas puff target

R. Rakowski; A. Bartnik; H. Fiedorowicz; R. Jarocki; J. Kostecki; J. Krzywiński; J. Mikołajczyk; L. Ryć; M. Szczurek; P. Wachulak

doi:10.1117/12.622218

11 October 2005 Spectral and spatial measurements of a laser-produced plasma EUV source for 13.5 nm based on a double stream Xe/He gas puff target

R. Rakowski, A. Bartnik, H. Fiedorowicz, R. Jarocki, J. Kostecki, J. Krzywiński, J. Mikołajczyk, L. Ryć, M. Szczurek, P. Wachulak

Author Affiliations +

Proceedings Volume 5958, Lasers and Applications; 59582W (2005) https://doi.org/10.1117/12.622218
Event: Congress on Optics and Optoelectronics, 2005, Warsaw, Poland

Abstract

The results of the spectral and spatial measurements of a laser-produced (LPP) plasma source of extreme ultraviolet (EUV) for 13.5 nm are presented. The double stream Xe/He gas puff target in the source was utilizing. The source was equipped with a Nd: YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M² = 2.5) and was dedicated to EUV metrology purposes. An advantage of this approach of the laser-plasma source is a debris free EUV emission. For the spectral research a transmission grating spectrograph (TGS) and a grazing incidence spectrograph (GIS) were utilized. For spatial measurements a pinhole camera was employed. The influence on EUV emission of the laser focal spot position in relation to the gas puff target and the time delays between opening valves and the laser pulse were investigated.

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R. Rakowski, A. Bartnik, H. Fiedorowicz, R. Jarocki, J. Kostecki, J. Krzywiński, J. Mikołajczyk, L. Ryć, M. Szczurek, and P. Wachulak "Spectral and spatial measurements of a laser-produced plasma EUV source for 13.5 nm based on a double stream Xe/He gas puff target", Proc. SPIE 5958, Lasers and Applications, 59582W (11 October 2005); https://doi.org/10.1117/12.622218

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