Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nm

Julien Gautier; Franck Delmotte; Marc Roulliay; Marie-Francoise Ravet; Francoise Bridou; Arnaud Jerome; Angelo Giglia; Stefano Nannarone

doi:10.1117/12.625030

4 October 2005 Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nm

Julien Gautier, Franck Delmotte, Marc Roulliay, Marie-Francoise Ravet, Francoise Bridou, Arnaud Jerome, Angelo Giglia, Stefano Nannarone

Author Affiliations +

Proceedings Volume 5963, Advances in Optical Thin Films II; 59630X (2005) https://doi.org/10.1117/12.625030
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

We present an experimental study of aging and thermal stability of Sc/Si multilayers deposited by magnetron sputtering. These multilayers have been characterized by using hard X-ray grazing incidence reflectometry at 0.154 nm and synchrotron radiation reflectometry at near normal incidence. The reflectivity was found to be stable after one year. A maximum reflectivity of 46% has been measured at 46 nm. However a 20% relative decrease of the reflectivity have been observed after one hour thermal annealing at 200°C. In order to improve thermal stability, we studied two different barriers layers (B4C and ScN ). We compare the decrease of peak reflectivity and its wavelength shift after one hour annealing at 200°C under argon atmosphere. The best result was observed with the design using 0.3 nm B4C barrier layers. A relative decrease of 2% of the reflectivity peak has been observed with this design as compared to a 20% decrease without barrier layers.

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Julien Gautier, Franck Delmotte, Marc Roulliay, Marie-Francoise Ravet, Francoise Bridou, Arnaud Jerome, Angelo Giglia, and Stefano Nannarone "Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nm", Proc. SPIE 5963, Advances in Optical Thin Films II, 59630X (4 October 2005); https://doi.org/10.1117/12.625030

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