Paper
11 March 2008 Growth and characterization of Li-doped ZnO thin films on nanocrystalline diamond substrates
Jian Huang, Yiben Xia, Linjun Wang, Jinyong Xu, Guang Hu, Xuefeng Zhu, Weimin Shi
Author Affiliations +
Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69841T (2008) https://doi.org/10.1117/12.792639
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
Nanocrystalline diamond(NCD) films with a mean surface roughness of 23.8 nm were grown on silicon substrates in a hot filament chemical vapor deposition(HFCVD) system. Then, Zn1-xLixO (x=0, 0.05, 0.10, 0.15) films were deposited on these NCD films by radio-frequency(RF) reactive magnetron sputtering method. When x was 0.1, the Li-doped ZnO film had a larger resistivity more than 108Ω•cm obtained from Hall effect measurement. All the Zn1-xLixO films had a strong c-axis orientation structure determined by X-ray diffraction (XRD). The above results suggested that the Li-doped ZnO film/NCD structure prepared in this work was attractive for the application of high frequency surface acoustic wave (SAW) devices.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jian Huang, Yiben Xia, Linjun Wang, Jinyong Xu, Guang Hu, Xuefeng Zhu, and Weimin Shi "Growth and characterization of Li-doped ZnO thin films on nanocrystalline diamond substrates", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69841T (11 March 2008); https://doi.org/10.1117/12.792639
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KEYWORDS
Zinc oxide

Diamond

Lithium

Surface roughness

Sputter deposition

Thin films

Acoustics

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