Nanoprocessing of semiconductors and metals with nJ femtosecond laser pulses

R. Le Harzic; D. Sauer; I. Riemann; K. König

doi:10.1117/12.629659

3 November 2005 Nanoprocessing of semiconductors and metals with nJ femtosecond laser pulses

R. Le Harzic, D. Sauer, I. Riemann, K. König

Proceedings Volume 5989, Technologies for Optical Countermeasures II; Femtosecond Phenomena II; and Passive Millimetre-Wave and Terahertz Imaging II; 59890O (2005) https://doi.org/10.1117/12.629659
Event: European Symposium on Optics and Photonics for Defence and Security, 2005, Bruges, Belgium

Abstract

We report on sub-μm structuring of semiconductors, dielectrics, polymers and metals using a laser scanning microscope. A commercial Ti:Sapphire oscillator laser (20 nJ/pulse; 90 MHz; 150 fs) was coupled into a laser scanning microscope FemtOcut (JenLab GmbH). High numerical aperture objectives were applied to obtain fluences in the range of a few J/cm² which are well above the ablation threshold. Such a cost-effective and reliable system compared to amplified lasers systems (μJ or mJ/pulse) is adapted for material manufacturing and can be of prime interest for specific applications in security like counterfeiting.

Citation Download Citation

R. Le Harzic, D. Sauer, I. Riemann, and K. König "Nanoprocessing of semiconductors and metals with nJ femtosecond laser pulses", Proc. SPIE 5989, Technologies for Optical Countermeasures II; Femtosecond Phenomena II; and Passive Millimetre-Wave and Terahertz Imaging II, 59890O (3 November 2005); https://doi.org/10.1117/12.629659

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