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Proceedings Article

Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points

[+] Author Affiliations
F. Horst, B. J. Offrein

IBM Zürich Research Lab. (Switzerland)

William M. J. Green, Yurii Vlasov

IBM T.J. Watson Research Ctr.

Proc. SPIE 6996, Silicon Photonics and Photonic Integrated Circuits, 69960R (May 01, 2008); doi:10.1117/12.781232
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From Conference Volume 6996

  • Silicon Photonics and Photonic Integrated Circuits
  • Giancarlo C. Righini; Seppo K. Honkanen; Lorenzo Pavesi; Laurent Vivien
  • Strasbourg, France | April 07, 2008

abstract

We present ultra-compact integrated optical echelle grating WDM (de-)multiplexers for on-chip optical networks. These devices are based on a design with two stigmatic points. The devices were fabricated using Silicon-On-Insulator (SOI) photonic waveguide technology thus the smallest version of the (de-)multiplexer occupies an area of only 250x200 μm. We will show measurement results on different variations of the echelle grating devices. In the measurements, we found a channel to channel isolation of 19 dB. The minimum insertion loss, relative to a straight waveguide, is only 3 dB with a channel to channel variation of 0.5 dB.nefit of the numerical reconstruction properties of DH in combination with diffraction grating to get super-resolution. Various attempts have been performed and results are presented and discussed. The approaches could be used for metrology and imaging application in various fields of engineering and biology.

© (2008) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

F. Horst ; William M. J. Green ; B. J. Offrein and Yurii Vlasov
"Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points", Proc. SPIE 6996, Silicon Photonics and Photonic Integrated Circuits, 69960R (May 01, 2008); doi:10.1117/12.781232; http://dx.doi.org/10.1117/12.781232


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