Paper
8 February 2007 Nitride-based light-emitting diodes with p-AlInGaN surface layers prepared at various temperatures
C. W. Kuo, C. M. Chen, C. H. Kuo, G. C. Chi
Author Affiliations +
Abstract
We have prepared bulk p-AlInGaN layers and light emitting diodes (LEDs) with p-AlInGaN surface layers by metalorganic chemical vapor deposition (MOCVD). It was found that surfaces of the LEDs with p-AlInGaN layers were rough with high density of hexagonal pits. It was also found that pit width and pit density depend on the growth temperature of the p-AlInGaN layer. Furthermore, it was found that we can achieve 62% enhancement in output intensity from the LED with 820°C p-AlInGaN cap layer without increasing the LED operation voltage.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. W. Kuo, C. M. Chen, C. H. Kuo, and G. C. Chi "Nitride-based light-emitting diodes with p-AlInGaN surface layers prepared at various temperatures", Proc. SPIE 6473, Gallium Nitride Materials and Devices II, 64730U (8 February 2007); https://doi.org/10.1117/12.700303
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Light emitting diodes

Gallium nitride

Indium gallium nitride

Metalorganic chemical vapor deposition

Aluminum

Gallium

Chemical species

RELATED CONTENT


Back to Top