Positive identification of lithographic photoresists using real-time index of refraction monitoring for reduced cost of ownership

Ron Jee; Susanne Pepper; David Stedman

doi:10.1117/12.814291

23 March 2009 Positive identification of lithographic photoresists using real-time index of refraction monitoring for reduced cost of ownership

Ron Jee, Susanne Pepper, David Stedman

Author Affiliations +

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 727223 (2009) https://doi.org/10.1117/12.814291
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

This study involved installation of a real-time refractive index monitoring system into a simulated photoresist feed line as would be used for delivery to a lithography tool. The goal was to determine whether this refractive index technology could be used to differentiate among all possible photoresists that could potentially be delivered to a lithography tool and resolve each one, separate from the others. The main intention is to use this technology to prevent the wrong photoresist from being used. The use of the wrong photoresist could result in hundreds of thousands of dollars per year in wafers scrapped in late stages of the process flow. A Swagelok(R) CR-288(R) concentration monitor, using refractive index (RI) sensing, was installed into a simulated photoresist feed line to monitor and detect each one in real time. By integrating the CR-288 concentration monitor into the lithographic process system, the capability for uniquely identifying and resolving 10 out of 10 Deep Ultra Violet (DUV) photoresists was demonstrated, potentially leading to a large cost avoidance and reduced cost of ownership.

Citation Download Citation

Ron Jee, Susanne Pepper, and David Stedman "Positive identification of lithographic photoresists using real-time index of refraction monitoring for reduced cost of ownership", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727223 (23 March 2009); https://doi.org/10.1117/12.814291

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available