Lithographic evaluation and chemical modeling of acid amplifiers used in EUV photoresists

Robert Brainard; Craig Higgins; Seth Kruger; Srividya Revuru; Brian Cardineau; Sarah Gibbons; Dan Freedman; Harun Solak; Wang Yueh; Todd Younkin

doi:10.1117/12.814308

1 April 2009 Lithographic evaluation and chemical modeling of acid amplifiers used in EUV photoresists

Robert Brainard, Craig Higgins, Seth Kruger, Srividya Revuru, Brian Cardineau, Sarah Gibbons, Dan Freedman, Harun Solak, Wang Yueh, Todd Younkin

Author Affiliations +

Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 72733Q (2009) https://doi.org/10.1117/12.814308
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

This paper describes the lithographic properties of fifteen acid amplifiers (AAs) and the chemical modeling approach used to predict their thermal stability in an ESCAP polymer resist system at 70 and 110 °C. Specifically, we show how added AAs affect the sensitivity (Eo and Esize), resolution, line edge roughness (LER), exposure latitude, and Z-parameter of ESCAP resists. We find that acid amplifiers that generate fluorinated sulfonic acids give the best combination of sensitivity, LER, and exposure latitude. Additionally, we show that these compounds are not photochemically active. Combining thermodynamic and kinetic modeling has allowed us to predict the relative enthalpies of activation for catalyzed and uncatalyzed decomposition pathways and compare the results to experimental thermal stability tests.

Citation Download Citation

Robert Brainard, Craig Higgins, Seth Kruger, Srividya Revuru, Brian Cardineau, Sarah Gibbons, Dan Freedman, Harun Solak, Wang Yueh, and Todd Younkin "Lithographic evaluation and chemical modeling of acid amplifiers used in EUV photoresists", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72733Q (1 April 2009); https://doi.org/10.1117/12.814308

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available