Mueller polarimetry in the back focal plane

A. De Martino; S. Ben Hatit; M. Foldyna

doi:10.1117/12.708627

5 April 2007 Mueller polarimetry in the back focal plane

A. De Martino, S. Ben Hatit, M. Foldyna

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65180X (2007) https://doi.org/10.1117/12.708627
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

A new Mueller polarimeter based on liquid crystals and a microscope objective is presented, for the characterization of diffraction gratings in a conical diffraction mounting. Fast measurements of complete Mueller matrices over a range of polar angles (0-56°) and azimuthal angles (0-360°) are achieved without mechanical movements. The polarization state generator and analyzer make use of nematic variable retarders. The angular range is achieved through focalization of light over the measured sample with a microscope objective with a high numerical aperture and imaging of the objective back Fourier plane on a CCD. Results on isotropic samples and diffraction gratings are shown.

Citation Download Citation

A. De Martino, S. Ben Hatit, and M. Foldyna "Mueller polarimetry in the back focal plane", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65180X (5 April 2007); https://doi.org/10.1117/12.708627

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