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Proceedings Article

eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool

[+] Author Affiliations
Elmar Platzgummer, Christof Klein, Hans Loeschner

IMS Nanofabrication AG (Austria)

Proc. SPIE 8166, Photomask Technology 2011, 816622 (October 13, 2011); doi:10.1117/12.895523
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From Conference Volume 8166

  • Photomask Technology 2011
  • Wilhelm Maurer; Frank E. Abboud
  • Monterey, California | September 19, 2011

abstract

Based on a massively parallel beam writing strategy (BACUS 2010) a mask writer proof-of-concept tool was realized in 2011. The eMET (electron Mask Exposure Tool) POC column is designed to provide ca. 262-thousand (512 x 512) programmable beams of 50 keV energy and 20 nm or 10 nm beam size. The total beam current through the column is up to 1 μA. The eMET POC is equipped with a laser-interferometer controlled stage for exposure of one cm2 test pattern fields on 6" mask blanks. Operating the eMET POC with a stencil plate, first exposure results are presented. The further eMET POC project plan and the roadmap for eMET Alpha, Beta and multi-generational HVM tools are outlined.

© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Elmar Platzgummer ; Christof Klein and Hans Loeschner
"eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool", Proc. SPIE 8166, Photomask Technology 2011, 816622 (October 13, 2011); doi:10.1117/12.895523; http://dx.doi.org/10.1117/12.895523


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