Based on a massively parallel beam writing strategy (BACUS 2010) a mask writer proof-of-concept tool was realized in 2011. The eMET (electron Mask Exposure Tool) POC column is designed to provide ca. 262-thousand (512 x 512) programmable beams of 50 keV energy and 20 nm or 10 nm beam size. The total beam current through the column is up to 1 μA. The eMET POC is equipped with a laser-interferometer controlled stage for exposure of one cm2 test pattern fields on 6" mask blanks. Operating the eMET POC with a stencil plate, first exposure results are presented. The further eMET POC project plan and the roadmap for eMET Alpha, Beta and multi-generational HVM tools are outlined.© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.