CMOS-compatible LVOF-based visible microspectrometer

Arvin Emadi; Huaiwen Wu; Ger de Graaf; Reinoud F. Wolffenbuttel

doi:10.1117/12.849844

27 April 2010 CMOS-compatible LVOF-based visible microspectrometer

Arvin Emadi, Huaiwen Wu, Ger de Graaf, Reinoud F. Wolffenbuttel

Proceedings Volume 7680, Next-Generation Spectroscopic Technologies III; 76800W (2010) https://doi.org/10.1117/12.849844
Event: SPIE Defense, Security, and Sensing, 2010, Orlando, Florida, United States

Abstract

This paper reports on a CMOS-Compatible Linear Variable Optical Filter (LVOF) visible micro-spectrometer. The CMOS-compatible post process for fabrication of the LVOF has been used for integration of the LVOF with a CMOS chip containing a 128-element photodiode array and readout circuitry. Fabrication of LVOF involves a process for fabrication of very small taper angles, ranging from 0.001° to 0.1°, in SiO₂. These layers can be fabricated flexibly in a resist layer by just one lithography step and a subsequent reflow process. The 3D pattern of the resist structures is subsequently transferred into SiO₂ by appropriate etching. Complete LVOF fabrication involves CMOS-compatible deposition of a lower dielectric mirror using a stack of dielectrics on the wafer, tapered layer formation and deposition of the top dielectric mirror. The LVOF has been optimized for 580 nm - 720 nm spectral operating range and has also been mounted on a CCD camera for characterization. The design of LVOF micro-spectrometer, the fabrication and characterization results are presented.

Citation Download Citation

Arvin Emadi, Huaiwen Wu, Ger de Graaf, and Reinoud F. Wolffenbuttel "CMOS-compatible LVOF-based visible microspectrometer", Proc. SPIE 7680, Next-Generation Spectroscopic Technologies III, 76800W (27 April 2010); https://doi.org/10.1117/12.849844

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