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Proceedings Article

CMOS-compatible LVOF-based visible microspectrometer

[+] Author Affiliations
Arvin Emadi, Huaiwen Wu, Ger de Graaf, Reinoud F. Wolffenbuttel

Delft Univ. of Technology (Netherlands)

Proc. SPIE 7680, Next-Generation Spectroscopic Technologies III, 76800W (April 27, 2010); doi:10.1117/12.849844
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From Conference Volume 7680

  • Next-Generation Spectroscopic Technologies III
  • Mark A. Druy; Christopher D. Brown; Richard A. Crocombe
  • Orlando, Florida | April 05, 2010

abstract

This paper reports on a CMOS-Compatible Linear Variable Optical Filter (LVOF) visible micro-spectrometer. The CMOS-compatible post process for fabrication of the LVOF has been used for integration of the LVOF with a CMOS chip containing a 128-element photodiode array and readout circuitry. Fabrication of LVOF involves a process for fabrication of very small taper angles, ranging from 0.001° to 0.1°, in SiO2. These layers can be fabricated flexibly in a resist layer by just one lithography step and a subsequent reflow process. The 3D pattern of the resist structures is subsequently transferred into SiO2 by appropriate etching. Complete LVOF fabrication involves CMOS-compatible deposition of a lower dielectric mirror using a stack of dielectrics on the wafer, tapered layer formation and deposition of the top dielectric mirror. The LVOF has been optimized for 580 nm - 720 nm spectral operating range and has also been mounted on a CCD camera for characterization. The design of LVOF micro-spectrometer, the fabrication and characterization results are presented.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Arvin Emadi ; Huaiwen Wu ; Ger de Graaf and Reinoud F. Wolffenbuttel
"CMOS-compatible LVOF-based visible microspectrometer", Proc. SPIE 7680, Next-Generation Spectroscopic Technologies III, 76800W (April 27, 2010); doi:10.1117/12.849844; http://dx.doi.org/10.1117/12.849844


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