Paper
15 February 2012 Fabrication of photo-induced microstructure embedded inside ZnO crystal
Yuichiro Ishikawa, Yasuhiko Shimotsuma, Akio Kaneta, Masaaki Sakakura, Masayuki Nishi, Kiyotaka Miura, Kazuyuki Hirao, Yoichi Kawakami
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Abstract
In this paper, micromachining inside of direct and indirect semiconductor, such as zinc oxide crystal (ZnO) and single-crystalline silicon(c-Si) using femtosecond laser pulses is successfully demonstrated. In the case of ZnO, oxygen vacancy or interstitial zinc was three-dimensionally induced by the near-infrared femtosecond laser pulse irradiation. The threshold energy for oxygen defect formation increased with increasing in a pulse width. The mechanism of the pulsewidth dependence of the damage threshold inside ZnO could be interpreted in terms of the excitonic Mott transition to the electron-hole plasma which depends on the electron plasma density induced by the laser irradiation. We have also successfully micromachined inside c-Si using infrared ultrashort laser pulses (λ = 1.24 μm). Optical microscope observation under an infrared lamp illumination indicates low density material or scattering structure was formed in the vicinity of the focal spot.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuichiro Ishikawa, Yasuhiko Shimotsuma, Akio Kaneta, Masaaki Sakakura, Masayuki Nishi, Kiyotaka Miura, Kazuyuki Hirao, and Yoichi Kawakami "Fabrication of photo-induced microstructure embedded inside ZnO crystal", Proc. SPIE 8243, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVII, 82430N (15 February 2012); https://doi.org/10.1117/12.908190
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Zinc oxide

Crystals

Femtosecond phenomena

Semiconductors

Pulsed laser operation

Plasma

Oxygen

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