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Proceedings Article

Crystallization of amorphous silicon films by a Nd:YAG laser and correlated surface morphology

[+] Author Affiliations
Jing Jin, Lu Huang, Weimin Shi, Zechun Cao

Shanghai Univ. (China)

Zhijun Yuan, Jun Zhou

Shanghai Institute of Optics and Fine Mechanics (China)

Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950E (February 17, 2011); doi:10.1117/12.888222
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From Conference Volume 7995

  • Seventh International Conference on Thin Film Physics and Applications
  • Junhao Chu; Zhanshan Wang
  • Shanghai, China | September 24, 2010

abstract

The phosphorous (P)-doped hydrogenated amorphous silicon (a-Si:H) thin films were crystallized by a frequency-doubled (λ=532 nm) Nd:YAG pulsed nanosecond laser with laser beam shaping system introduced by a fly-eye lens array. The correlations among crystallization, stress and microstructures with surface morphology during crystallization process can be determined. The increased crystalline fraction (X C) is realized by a considerable stress release. It is observed that the periodic two dimensional grid patterns with the period of about 15 μm are formed at laser energy density (E L) of 740 mJ/cm2 and are very sensitive to the energy density. Further increasing laser energy density to laser ablation can give rise to the irradiation damage on the film with poor crystalline quality and high surface roughness.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Jing Jin ; Lu Huang ; Zhijun Yuan ; Weimin Shi ; Zechun Cao, et al.
"Crystallization of amorphous silicon films by a Nd:YAG laser and correlated surface morphology", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950E (February 17, 2011); doi:10.1117/12.888222; http://dx.doi.org/10.1117/12.888222


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