The influence of micron-sized nodules on the electric-field districution in thin-film polarizers

Naibo Chen; Yonggang Wu; Zhenhua Wang; Leijie Ling; Zihuan Xia; Heyun Wu; Gang Lv

doi:10.1117/12.887565

18 February 2011 The influence of micron-sized nodules on the electric-field districution in thin-film polarizers

Naibo Chen, Yonggang Wu, Zhenhua Wang, Leijie Ling, Zihuan Xia, Heyun Wu, Gang Lv

Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 79950Q (2011) https://doi.org/10.1117/12.887565
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China

Abstract

The influence of micron-sized nodules on the electric-field enhancement in the HfO₂/SiO₂ thin-film polarizers with non-quarter- wave layers at 1053nm and 56° is studied using the finite-difference time-domain electromagnetic modeling. The theoretical results show that the electric-field enhancements in HfO₂ material are greater at s polarization than those at ppolarization. Nodular defect originating from the large, shallow seed leads to the highest electric-field enhancement while that containing the small, deep seed leads to the lowest electric-field enhancement. The TFP coating designed with the electric-field peaks located in the SiO₂ layers has no obvious advantage in decreasing the laser-induced damage than that designed with the electric-field peaks located in the HfO₂ layers, once they have the similar nodular defects in them.

Citation Download Citation

Naibo Chen, Yonggang Wu, Zhenhua Wang, Leijie Ling, Zihuan Xia, Heyun Wu, and Gang Lv "The influence of micron-sized nodules on the electric-field districution in thin-film polarizers", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950Q (18 February 2011); https://doi.org/10.1117/12.887565

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