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Proceedings Article

Extreme ultraviolet reflective multilayers at 30.4nm

[+] Author Affiliations
Wenjuan Wu

Shanghai Institute of Technology (China)

Jingtao Zhu, Fengli Wang, Zhong Zhang, Hongchang Wang, Shumin Zhang, Zhanshan Wang, Lingyan Chen

Tongji Univ. (China)

Hongjun Zhou, Tonglin Huo

Univ. of Science and Technology of China (China)

Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950Z (February 17, 2011); doi:10.1117/12.888159
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From Conference Volume 7995

  • Seventh International Conference on Thin Film Physics and Applications
  • Junhao Chu; Zhanshan Wang
  • Shanghai, China | September 24, 2010

abstract

Mutilayers are important optical elements and widely used for extreme ultraviolet astronomical observation. For selecting the emission line multilayers should have high reflectivity and narrow spectral bandwidth. In this paper, six different multilayers including Si/C, Si/B4C, Si/Mo/B4C, Si/SiC, Mg/SiC and Mo/Si were designed for normal incidence angle of 5° at He-IIemission line(λ=30.4 nm). These multilayers have been fabricated using a direct current magnetron sputtering system. The period of multilayers were measured by X-ray diffractometer(XRD) and the reflectivities were measured on National Synchrotron Radiation Facility in Hefei, China. Then the reflectivities and the spectral bandwidth of these multilayers were compared respectively. It shows that the spectral bandwidth of multilayers of low Z materials is narrower than that of the normal Mo/Si multiayer, the reflectivity of Si/Mo/B4C multilayer is higher than that of Si-based multilayers of two kinds of materials. And Mg/SiC multilayer has the highest reflectivity of 43.81% and the narrowest spectral bandwidth of 1.44nm, which proves that Mg/SiC multilayer is more potential for selecting the emission line in extreme ultraviolet solar physics.

© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Wenjuan Wu ; Jingtao Zhu ; Fengli Wang ; Zhong Zhang ; Hongchang Wang, et al.
"Extreme ultraviolet reflective multilayers at 30.4nm", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79950Z (February 17, 2011); doi:10.1117/12.888159; http://dx.doi.org/10.1117/12.888159


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