CsI:Tl scintillation films were prepared on the net-like patterning substrates. The pattern of the substrates as well as the morphology of the CsI:Tl films were measured by SEM. The results show that the size of each grid on substrate is 55μm which is formed by SU-8 photoresist with 5μm in both height and width, and the CsI:Tl films display quite a good columnar structure. The spatial resolutions of X-ray imaging were taken by MTF measurement. The spatial frequency of the CsI:Tl films on patterned substrates can reach up to 10 lp/mm at the 10% level of MTF, which is twice higher than that of the CsI:Tl film on the substrate without patterning.© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.