Effects of technological parameters on microstructure and properties of CrAlN coating deposited by DC magnetron sputtering

Lihong Yang; Kangpei Zheng; Ping Liu; Wei Li

doi:10.1117/12.888040

24 May 2011 Effects of technological parameters on microstructure and properties of CrAlN coating deposited by DC magnetron sputtering

Lihong Yang, Kangpei Zheng, Ping Liu, Wei Li

Author Affiliations +

Proceedings Volume 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering; 79970M (2011) https://doi.org/10.1117/12.888040
Event: Fourth International Seminar on Modern Cutting and Measuring Engineering, 2010, Beijing, China

Abstract

In this paper, the deposition processes of CrAlN coatings on high speed steel (M2) substrate was mainly researched, which made by reactive direct current (DC) magnetron sputtering with AlCr alloy target. The effects of technological parameters (Ar/N₂ flow ratio, gas pressure and substrate temperature) on the microstructure and properties of CrAlN coatings were systematically studied with scanning electron microscopy (SEM), X-ray diffraction (XRD), energy dispersive spectrum (EDS) and nano-indentation techniques. The results indicated that Ar/N₂ flow rate, gas pressure and substrate temperature greatly influenced the microstructure and properties of CrAlN coatings. With Ar/N₂ flow ratio of 1, gas pressure of 0.2Pa and substrate temperature of 300°C, the hardness and elastic modulus of CrAlN coating were 34.8GPa and 434.3GPa respectively.

Citation Download Citation

Lihong Yang, Kangpei Zheng, Ping Liu, and Wei Li "Effects of technological parameters on microstructure and properties of CrAlN coating deposited by DC magnetron sputtering", Proc. SPIE 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering, 79970M (24 May 2011); https://doi.org/10.1117/12.888040

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