Resistance is one of four basic parameters of quartz crystal, and the others can be deducted from it. However, its strict requirements on fabrication technology for π network, and the phase shift induced by tray reactance and quartz crystal static capacitance, the highest accuracy measurements of resistance is difficult to be realized. Here, active compensation to additional-phase offset induced by stray reactance in π network and quartz crystal static capacitance (C0 ) is presented, which facilitates measurement of resistance of quartz crystal, and reduces the requirements of fabrication technology for π network. The experimental result indicates that the measurement accuracy of resistance R1 in quartz crystal can be up to ±5% with this measurement system.© (2010) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.