Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment

M. Kaestner; I. W. Rangelow

doi:10.1117/12.916263

21 March 2012 Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment

M. Kaestner, I. W. Rangelow

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83231G (2012) https://doi.org/10.1117/12.916263
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

To keep on with scaling down of nanoelectronic components novel lithographic approaches are required. The direct, positive-tone lithography of calixarene molecular resists by scanning probe techniques represents a promising alternative for ease-of-use sub-10 nm mask-less lithography. Herein, we demonstrate a closed loop tip-based nanolithography using the same nanoprobe for: (i) AFM pre-imaging for pattern overlay alignment; (ii) direct writing of features into calixarene molecular resist applying a highly confined, development-less removal process; and (iii) AFM post-imaging as final in-situ inspection. In addition, we demonstrate parallel writing capabilities by employing multi nano-tip probes. By using these methods we can drastically enhance the attractiveness of calixarene molecular resist as development-less, high resolution resist material for Scanning Probe Lithography (SPL).

Citation Download Citation

M. Kaestner and I. W. Rangelow "Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231G (21 March 2012); https://doi.org/10.1117/12.916263

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