Non-destructive 3D characterization of microchannels

Ville Heikkinen; Anton Nolvi; Ivan Kassamakov; Kestutis Grigoras; Sami Franssila; Edward Hæggström

doi:10.1117/12.930080

25 October 2012 Non-destructive 3D characterization of microchannels

Ville Heikkinen, Anton Nolvi, Ivan Kassamakov, Kestutis Grigoras, Sami Franssila, Edward Hæggström

Proceedings Volume 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI; 84660R (2012) https://doi.org/10.1117/12.930080
Event: SPIE NanoScience + Engineering, 2012, San Diego, California, United States

Abstract

Microfluidic devices allow experimentation in smaller space using small amounts of liquid, resulting in improved reaction rates, cheaper equipment, reduced amount of expensive reagents. Very precise channel shape measurements are needed to assure the designed flow pattern. Several 3D imaging devices provide the necessary precision but typically they cannot image inside closed devices. Hence it is difficult to measure the shape of a microfluidic channel without destroying it. We fabricated and investigated samples with different microchannels. Several types of microfluidic channels were prepared in silicon wafer with a subsequent covering by bonding glass wafer on top. Microchannels in polymer have been done using epoxy-type photoresist SU-8. The internal geometry of the channels was measured using a Scanning White Light Interferometer (SWLI) equipped with optics that compensates for the effects of the top glass of the channels. The geometry of the interior of the channels can be measured with a precision similar to surface layer SWLI measurements without destroying the channels.

Citation Download Citation

Ville Heikkinen, Anton Nolvi, Ivan Kassamakov, Kestutis Grigoras, Sami Franssila, and Edward Hæggström "Non-destructive 3D characterization of microchannels", Proc. SPIE 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI, 84660R (25 October 2012); https://doi.org/10.1117/12.930080

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Glasses

Silicon

Semiconducting wafers

Oxides

Microfluidics

Photoresist materials

Photomasks

Show All Keywords

Keywords/Phrases

Search In:

Publication Years