Fabrication of Two Dimensional Carbon Nanostructures using Hot Wire Chemical Vapor Deposition Technique

Mukesh Singh; Himanshu S. Jha; Asha Yadav; . Lalhriatzuala; Dinesh Deva; Pratima Agarwal

doi:10.1117/12.927273

15 October 2012 Fabrication of two dimensional carbon nanostructures using hot wire chemical vapor deposition technique

Mukesh Singh, Himanshu S. Jha, Asha Yadav, . Lalhriatzuala, Dinesh Deva, Pratima Agarwal

Proceedings Volume 8549, 16th International Workshop on Physics of Semiconductor Devices; 854926 (2012) https://doi.org/10.1117/12.927273
Event: 16th International Workshop on Physics of Semiconductor Devices, 2011, Kanpur, India

Abstract

Two dimensional carbon nanostructures (carbon nanosheets) are fabricated using Hot Wire Chemical Vapor Deposition (HWCVD) technique assisted by H radical injection, using CH₄ as source gas. Carbon nanosheets are grown on crystalline Si(100) wafer as well as on corning glass substrate without using catalyst. The grown carbon nanosheets are aligned vertically on the substrate with thickness in the range of 10-20 nm and about 60-80 nm in height.

Citation Download Citation

Mukesh Singh, Himanshu S. Jha, Asha Yadav, . Lalhriatzuala, Dinesh Deva, and Pratima Agarwal "Fabrication of two dimensional carbon nanostructures using hot wire chemical vapor deposition technique", Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 854926 (15 October 2012); https://doi.org/10.1117/12.927273

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