RDMS: a Windows and tablet PC based reticle defect search
database with AHDC for interconnected mask and wafer fabs

Saghir Munir; Gul Qidwai

doi:10.1117/12.964981

8 November 2012 RDMS: a Windows and tablet PC based reticle defect search database with AHDC for interconnected mask and wafer fabs

Saghir Munir, Gul Qidwai

Author Affiliations +

Proceedings Volume 8522, Photomask Technology 2012; 85221Z (2012) https://doi.org/10.1117/12.964981
Event: SPIE Photomask Technology, 2012, Monterey, California, United States

Abstract

Ever imagine life without a search engine? Now imagine if there was a search engine for reticle defects that allowed you to search, trend size, and relate defects on any reticle from any inspection tool, in any of your interconnected fabs, at any time with a performance similar to a typical Google search. What would you do with it? With EUV upon us and the uncertainly involving EUV defect classification, it is important that the process engineers have access to as much defect data as possible. Here such data is made available on Windows based PCs and tablet computers.

Citation Download Citation

Saghir Munir and Gul Qidwai "RDMS: a Windows and tablet PC based reticle defect search database with AHDC for interconnected mask and wafer fabs", Proc. SPIE 8522, Photomask Technology 2012, 85221Z (8 November 2012); https://doi.org/10.1117/12.964981

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