Parameters affecting pattern fidelity and line edge roughness under diffraction effects in optical maskless lithography using a digital micromirror device

Manseung Seo; Taehyoung Lee; Haeryung Kim

doi:10.1117/12.2000855

26 November 2012 Parameters affecting pattern fidelity and line edge roughness under diffraction effects in optical maskless lithography using a digital micromirror device

Manseung Seo, Taehyoung Lee, Haeryung Kim

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Proceedings Volume 8557, Optical Design and Testing V; 855724 (2012) https://doi.org/10.1117/12.2000855
Event: Photonics Asia, 2012, Beijing, China

Abstract

In optical maskless lithography in concern, a digital micromirror device plays the role of a digital mask. Due to the spatial/temporal configuration of micromirror arrays/response or the specification of illumination/projection optics, the irradiance may be influenced by diffraction effects. In present study, an investigation of various optical maskless lithography models based on binary micromirror reflections is performed in consideration of the diffraction effect. To evaluate lithographic parameters dissolved in the lithography models, parametric studies are performed focusing on pattern fidelity and line edge roughness. To reduce corner rounding phenomena due to an image size and further to a reflection criterion, the auxiliary corner reflection adjusting feature (ACRAF) analogous to conventional serif are employed and the effectiveness of ACRAFs is analyzed. The potential of utilizing the adjusted parameters for enhancing pattern fidelity and line edge roughness under diffraction effects is demonstrated through simulations and experiments.

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Manseung Seo, Taehyoung Lee, and Haeryung Kim "Parameters affecting pattern fidelity and line edge roughness under diffraction effects in optical maskless lithography using a digital micromirror device", Proc. SPIE 8557, Optical Design and Testing V, 855724 (26 November 2012); https://doi.org/10.1117/12.2000855

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KEYWORDS

Lithography

Diffraction

Digital micromirror devices

Micromirrors

Line edge roughness

Gaussian beams

Maskless lithography

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