Novel fluorinated compounds for releasing material in nanoimprint lithography

Tsuneo Yamashita; Hisashi Mitsuhashi; Masamichi Morita

doi:10.1117/12.2011966

26 March 2013 Novel fluorinated compounds for releasing material in nanoimprint lithography

Tsuneo Yamashita, Hisashi Mitsuhashi, Masamichi Morita

Proceedings Volume 8680, Alternative Lithographic Technologies V; 86800D (2013) https://doi.org/10.1117/12.2011966
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

In recent years, utilization and reduction of pattern size are following nanoimprint lithography (NIL) quickly. In nanoimprinting, since it is contact printing, a higher separation force might cause damages to the master and imprinting tool, degradation in pattern quality as well. There is a mold-release characteristic of a master and resin as one of the biggest subjects in utilization. Although Optool DSX^TM (DAIKIN Ind. Ltd.) is an de facto standard as mold releasing reagent now, there is a problem in durability at UV-NIL. Then, we focused on the material which raises the mold-release characteristic of resist. The new fluorinated copolymers based on α-chloroacrylate and the low molecular weight perfluorocompounds, added to resist was developed. In this paper, we will report these synthesis method, specific properties such as static contact angle, releasing force and further fluorinated compounds were segregated resin surface.

Citation Download Citation

Tsuneo Yamashita, Hisashi Mitsuhashi, and Masamichi Morita "Novel fluorinated compounds for releasing material in nanoimprint lithography", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86800D (26 March 2013); https://doi.org/10.1117/12.2011966

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