Perpendicular orientation of block-co-polymer on controlled neutralization layer

Daiju Shiono; Tsuyoshi Kurosawa; Kenichiro Miyashita; Tasuku Matsumiya; Ken Miyagi; Katsumi Ohmori

doi:10.1117/12.2011638

26 March 2013 Perpendicular orientation of block-co-polymer on controlled neutralization layer

Daiju Shiono, Tsuyoshi Kurosawa, Kenichiro Miyashita, Tasuku Matsumiya, Ken Miyagi, Katsumi Ohmori

Proceedings Volume 8680, Alternative Lithographic Technologies V; 86801Q (2013) https://doi.org/10.1117/12.2011638
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

We have prepared and analyzed neutralization layer material to perform perpendicular morphology of Poly (styrene-block-methyl methacrylate) (PS-b-PMMA) as Block-Co-Polymers (BCPs). Neutralization layer surface property is optimized by changing hydrophilicity. We have evaluated two types of neutralization layer material. First one is graft type polymer which makes chemical bonding to substrate. The other is crosslink type polymer which becomes insoluble to organic solvent by thermal crosslink reaction. We checked neutralization function by changing film thickness of the neutralization layer under PS-b-PMMA. Regarding to graft type, it was found that when the film thickness of neutralization layer is over 2.3 nm, PS-b-PMMA forms perpendicular morphology on appropriate neutralization layer. Similarly, regarding to crosslink type, it was found that when the film thickness of neutralization layer is over 1.9 nm, PS-b-PMMA forms perpendicular morphology on appropriate neutralization layer. Finally, we will show lamella and cylinder patterns changing L₀ of PS-b-PMMA on neutralization layer.

Citation Download Citation

Daiju Shiono, Tsuyoshi Kurosawa, Kenichiro Miyashita, Tasuku Matsumiya, Ken Miyagi, and Katsumi Ohmori "Perpendicular orientation of block-co-polymer on controlled neutralization layer", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801Q (26 March 2013); https://doi.org/10.1117/12.2011638

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