All six NXE:3100, 0.25 NA EUV exposure systems are in use at customer sites enabling device development and cycles
of learning for early production work in all lithographic segments; Logic, DRAM, MPU, and FLASH memory. NXE
EUV lithography has demonstrated imaging and overlay performance both at ASML and end-users that supports sub-
27nm device work. Dedicated chuck overlay performance of <2nm has been shown on all six NXE:3100 systems.
The key remaining challenge is productivity, which translates to a cost-effective introduction of EUVL in high-volume
manufacturing (HVM). High volume manufacturing of the devices and processes in development is expected to be done
with the third generation EUV scanners - the NXE:3300B. The NXE:3300B utilizes an NA of 0.33 and is positioned at a
resolution of 22nm which can be extended to 18nm with off-axis illumination. The subsystem performance is improved
to support these imaging resolutions and overall productivity enhancements are integrated into the NXE platform
consistent with 125 wph. Since EUV reticles currently do not use a pellicle, special attention is given to reticle-addeddefects
performance in terms of system design and machine build including maintenance procedures.
In this paper we will summarize key lithographic performance of the NXE:3100 and the NXE:3300B, the NXE platform
improvements made from learning on NXE:3100 and the Alpha Demo Tool, current status of EUV sources and
development for the high-power sources needed for HVM.
Finally, the possibilities for EUV roadmap extension will be reviewed.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rudy Peeters ; Sjoerd Lok ; Erwin van Alphen ; Noreen Harned ; Peter Kuerz, et al.
ASML's NXE platform performance and volume introduction
", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86791F (April 1, 2013); doi:10.1117/12.2010932; http://dx.doi.org/10.1117/12.2010932