Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry

Xiuguo Chen; Shiyuan Liu; Chuanwei Zhang; Hao Jiang

doi:10.1117/12.2011487

10 April 2013 Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, Hao Jiang

Proceedings Volume 8681, Metrology, Inspection, and Process Control for Microlithography XXVII; 86812B (2013) https://doi.org/10.1117/12.2011487
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

As a non-imaging optical measurement technique, spectroscopic Mueller matrix polarimetry (MMP) has been introduced for critical dimension (CD) and overlay metrology with recent great success. Due to the additional information provided by the Mueller matrices when the most general conical diffraction configuration is considered, MMP has demonstrated a great potential in semiconductor manufacturing. In order to make full use of the additional information provided by the Mueller matrices, it is of great importance for MMP to optimize the measurement configuration. In this paper, we introduce the norm of a configuration error propagating matrix as the cost function to optimize the measurement configuration for spectroscopic MMP with the aim of finding an optimal combination of fixed incidence and azimuthal angles, which provides higher measurement accuracy. The optimal measurement configuration can be achieved by minimizing the norm of the configuration error propagating matrix in the available ranges of incidence and azimuthal angles. Experiments performed on a silicon grating with a dual-rotating compensator Mueller matrix polarimeter have demonstrated the validity of the proposed measurement configuration optimization method.

Citation Download Citation

Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, and Hao Jiang "Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86812B (10 April 2013); https://doi.org/10.1117/12.2011487

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available